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Please use this identifier to cite or link to this item: http://dspace.bsu.edu.ru/handle/123456789/28230
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dc.contributor.authorZakhvalinskii, V. S.-
dc.contributor.authorAbakumov, P. V.-
dc.contributor.authorPiljuk, E. A.-
dc.contributor.authorRodriguez, G. V.-
dc.contributor.authorGoncharov, I. Yu.-
dc.contributor.authorTaran, S. V.-
dc.date.accessioned2020-01-29T11:49:14Z-
dc.date.available2020-01-29T11:49:14Z-
dc.date.issued2015-
dc.identifier.citationTemperature influence on the properties of thin Si₃N₄ films / V.S. Zakhvalinskii [и др.] // Journal of Nano- and Electronic Physics. - 2015. - Vol.7, №4.-Art. 04052.ru
dc.identifier.urihttp://dspace.bsu.edu.ru/handle/123456789/28230-
dc.description.abstractApplying Raman spectroscopy, small-angle x-ray scattering, and atomic force microscopy it were studied phase composition and surface morphology of nanoscale films Si₃N₄ (obtained by RF magnetron sputtering)ru
dc.language.isoenru
dc.subjectphysicsru
dc.subjectsolid state physicsru
dc.subjectthin filmsru
dc.subjectnanoscale filmsru
dc.subjectpropertiesru
dc.subjecttemperature influenceru
dc.subjectRaman spectroscopyru
dc.subjectatomic force microscopyru
dc.subjectsmall-angle X-ray scatteringru
dc.titleTemperature influence on the properties of thin Si₃N₄ filmsru
dc.typeArticleru
Appears in Collections:Статьи из периодических изданий и сборников (на иностранных языках) = Articles from periodicals and collections (in foreign languages)

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