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Please use this identifier to cite or link to this item: http://dspace.bsu.edu.ru/handle/123456789/45293
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dc.contributor.authorSyshchenko, V. V.-
dc.contributor.authorTarnovsky, A. I.-
dc.date.accessioned2022-02-04T12:37:51Z-
dc.date.available2022-02-04T12:37:51Z-
dc.date.issued2021-
dc.identifier.citationSyshchenko, V.V. Statistical properties of the transverse-motion energy levels for channeling electrons in a silicon crystal under dynamical chaos conditions / V.V. Syshchenko, A.I. Tarnovsky // Journal of surface investigation: X-ray, synchrotron and neutron techniques. - 2021. - Vol.15, №4.- P. 728-731.ru
dc.identifier.urihttp://dspace.bsu.edu.ru/handle/123456789/45293-
dc.description.abstractThis paper studies the calculated energy levels of the transverse motion of relativistic electrons in the axial-channeling regime along the [100] direction of the silicon crystal which is described as motion in the smooth potential well. The nearest-level spacing distributions as well as the spectral rigidity are studied for the range of parameters where electron motion is chaotic within the classical limit. Both these characteristics demonstrate agreement with quantum-chaos-theory predictionsru
dc.language.isoenru
dc.subjectmechanicsru
dc.subjectdynamicsru
dc.subjectchaotic dynamicsru
dc.subjectquantum chaosru
dc.subjectchannelingru
dc.subjectenergy levelsru
dc.subjectnearest-neighbor spacing distributionru
dc.subjectWigner distributionru
dc.subjectspectral rigidityru
dc.titleStatistical properties of the transverse-motion energy levels for channeling electrons in a silicon crystal under dynamical chaos conditionsru
dc.typeArticleru
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